TINA 900
economical and reliable for special solutions

In this plant, the deposition of coating material and plasma generation for the plasma supported reactive coating are effected by hollow cathode arc discharge at temperatures below 500°C.

Considerable cost savings through use of coating materials which can be melted down in crucibles.

Smooth and droplet free single and multiple TiN, TiCN, TiC und CrN coatings are produced.

Simple, reproducible processing through use of a reliable Siemens control system.

A wide range of substrate holders is available for this plant.